| 摘要 |
The purpose of the invention is to provide: a polishing pad that has minute bubbles that are substantially uniform in the thickness direction and is already provided with openings without performing an opening-forming process such as surface grinding; and a manufacturing method for same. A polishing pad manufacturing method comprising: a process (1) of applying a mixed solution containing a polyurethane resin and an organic solvent onto a film-forming base material; after the application process, a process (2) of exposing the polyurethane resin for two minutes or more to an atmosphere of 10-80°C temperature and 65-100% relative humidity; and a process (3) of coagulating the polyurethane resin by immersion in a coagulation solution. |
