发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To improve a writing speed of a nonvolatile memory.SOLUTION: A nonvolatile memory includes a charge injection discharge part which has: an active region L2 having an upper surface US2, a side wall SS2 and a shoulder part S1 for linking the upper surface US2 and the side wall SS2; a conductive film 20 which covers the upper surface US2 and the shoulder part S1 of the active region L2 and a capacitance insulation film 10d provided between the conductive film 20 and the active region L2. The active region L2 has a projection PJ1 composed of a first depressed portion DP1 corresponding to the upper surface US2 and a second depressed portion DP2 corresponding to the side wall SS2, at the shoulder part S1.
申请公布号 JP2015211138(A) 申请公布日期 2015.11.24
申请号 JP20140092051 申请日期 2014.04.25
申请人 RENESAS ELECTRONICS CORP 发明人 TOYOKAWA SHIGEYA;KAMINAGA DODAI;YAMADA KENTARO
分类号 H01L21/336;G11C16/04;H01L21/8234;H01L21/8247;H01L27/08;H01L27/088;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/336
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