发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To improve a writing speed of a nonvolatile memory.SOLUTION: A nonvolatile memory includes a charge injection discharge part which has: an active region L2 having an upper surface US2, a side wall SS2 and a shoulder part S1 for linking the upper surface US2 and the side wall SS2; a conductive film 20 which covers the upper surface US2 and the shoulder part S1 of the active region L2 and a capacitance insulation film 10d provided between the conductive film 20 and the active region L2. The active region L2 has a projection PJ1 composed of a first depressed portion DP1 corresponding to the upper surface US2 and a second depressed portion DP2 corresponding to the side wall SS2, at the shoulder part S1. |
申请公布号 |
JP2015211138(A) |
申请公布日期 |
2015.11.24 |
申请号 |
JP20140092051 |
申请日期 |
2014.04.25 |
申请人 |
RENESAS ELECTRONICS CORP |
发明人 |
TOYOKAWA SHIGEYA;KAMINAGA DODAI;YAMADA KENTARO |
分类号 |
H01L21/336;G11C16/04;H01L21/8234;H01L21/8247;H01L27/08;H01L27/088;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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