发明名称 ELECTROLESS DEPOSITION OF CONTINUOUS PALLADIUM LAYER USING Co2+ METAL ION COMPLEX OR Ti3+ METAL ION COMPLEX AS REDUCER
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a Pd layer by electroless plating in order to form a semiconductor device, and an electroless plating solution without including an environmental load material (B, P, hydrazine, formalin).SOLUTION: The solution includes Pdions, and Coor Tiions as a reducer. Amine (aqueous ammonia, etc.) may be used as a complexing agent. The electroless plating solution is preferably mixed just before electroless plating.
申请公布号 JP2015209592(A) 申请公布日期 2015.11.24
申请号 JP20150087180 申请日期 2015.04.22
申请人 LAM RESEARCH CORPORATION 发明人 EUGENIJUS NORKUS;ALDONA JAGMINIENE;INA STANKEVICIENE;ANIRUDDHA JOI;YEZDI DORDI
分类号 C23C18/44;C23C18/16;H01L21/288 主分类号 C23C18/44
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