发明名称 |
Post-fabrication self-aligned initialization of integrated devices |
摘要 |
Defining an active region of a phase change memory (PCM) cell including depositing a first layer of material having a first chemical composition. A second layer of material having a second chemical composition is deposited on top of the first layer of material. An electrical current pulse is applied to locally heat a region of the first layer of material and the second layer of material to cause at least one of an inter-diffusion and a liquid mixing of the first layer of material and the second layer of material. This results in in the PCM cell containing a self-aligned region that includes a phase change material that is a mixture of the first chemical composition and the second chemical composition. |
申请公布号 |
US9196829(B2) |
申请公布日期 |
2015.11.24 |
申请号 |
US201313833139 |
申请日期 |
2013.03.15 |
申请人 |
GLOBALFOUNDRIES INC. |
发明人 |
Franceschini Michele M.;Karidis John P. |
分类号 |
H01L21/00;H01L45/00 |
主分类号 |
H01L21/00 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP |
主权项 |
1. A method of defining an active region of a phase change memory (PCM) cell comprising:
depositing a first layer of material having a first chemical composition, the depositing on top of a first conductive electrode region that forms a bit line and on top of a second conductive electrode region that includes a u-trench; depositing a second layer of material having a second chemical composition on top of the first layer of material; depositing a resist layer on top of the second layer of material; and applying an electrical current pulse to locally heat a region of the first layer of material and the second layer of material to cause at least one of an inter-diffusion and a liquid mixing of the first layer of material and the second layer of material, resulting in the PCM cell comprising a self-aligned region comprising a phase change material that is a mixture of the first chemical composition and the second chemical composition and a portion of the resist layer being sensitized; wherein the portion of the resist layer that is sensitized covers the self-aligned region of the PCM cell. |
地址 |
Grand Cayman KY |