发明名称 |
Protection of a wafer-level chip scale package (WLCSP) |
摘要 |
Consistent with an example embodiment, there is a method for assembling a wafer level chip scale processed (WLCSP) wafer; The wafer has a topside surface and an back-side surface, and a plurality of device die having electrical contacts on the topside surface. The method comprises back-grinding, to a thickness, the back-side surface the wafer. A protective layer of a thickness is molded onto the backside of the wafer. The wafer is mounted onto a sawing foil; along saw lanes of the plurality of device die, the wafer is sawed, the sawing occurring with a blade of a first kerf and to a depth of the thickness of the back-ground wafer. Again, the wafer is sawed along the saw lanes of the plurality of device die, the sawing occurring with a blade of a second kerf, the second kerf narrower than the first kerf, and sawing to a depth of the thickness of the protective layer. The plurality of device die are separated into individual device die. Each individual device die has a protective layer on the back-side, the protective layer having a stand-off distance from a vertical edge of the individual device die. |
申请公布号 |
US9196537(B2) |
申请公布日期 |
2015.11.24 |
申请号 |
US201313967164 |
申请日期 |
2013.08.14 |
申请人 |
NXP B.V. |
发明人 |
Van Gemert Leonardus Antonius Elisabeth;Buenning Hartmut;Kamphuis Tonny;Moeller Sascha;Zenz Christian |
分类号 |
H01L21/30;H01L21/46;H01L21/78;H01L21/301;H01L21/44;H01L21/48;H01L21/50;H01L21/782;H01L23/31;H01L21/56 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
|
主权项 |
1. A method for assembling a wafer level chip scale processed (WLCSP) wafer, the wafer having a front-side surface and a back-side surface, a plurality of device die having electrical contacts on the front-side surface, the method comprising:
back-grinding, to a thickness, the back-side surface the wafer; applying a protective layer of a thickness onto the back-side surface of the wafer; mounting the WLCSP wafer onto a sawing foil onto the back-side surface having the protective layer; sawing the WLCSP wafer in saw lanes of the plurality of device die on the front-side surface, the sawing occurring with a blade of a first kerf and to a first depth of the back-ground wafer thickness; again sawing the WLCSP along the saw lanes of the plurality of device die, the sawing occurring with a blade of a second kerf, the second kerf narrower than the first kerf, and sawing to a depth of the thickness of the protective layer; separating the plurality of device die into individual device die; wherein each individual device die has a protective layer on the back-side, the protective layer having a stand-off distance from a vertical edge of the individual device die. |
地址 |
Eindhoven NL |