发明名称 Processing liquid for suppressing pattern collapse of fine metal structure, and method for producing fine metal structure using same
摘要 There are provided a processing liquid that is capable of suppressing pattern collapse of a fine metal structure, such as a semiconductor device and a micromachine, and a method for producing a fine metal structure using the same. The processing liquid for suppressing pattern collapse of a fine metal structure, contains a phosphate ester and/or a polyoxyalkylene ether phosphate ester, and the method for producing a fine metal structure, uses the same.
申请公布号 US9196472(B2) 申请公布日期 2015.11.24
申请号 US201013388462 申请日期 2010.07.21
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC. 发明人 Ohto Masaru;Matsunaga Hiroshi;Yamada Kenji
分类号 H01L21/306;B81C1/00;C07F9/09;C09K3/00;H01L21/02 主分类号 H01L21/306
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A processing liquid for suppressing pattern collapse of a fine metal structure, consisting essentially of at least one ester represented by formula (1) or formula (2):wherein R1 represents an alkyl group having 2 to 24 carbon atoms or an alkenyl group having 2 to 24 carbon atoms; and R2 represents an alkanediyl group or an alkenediyl group having 2 to 6 carbon atoms, in which plural groups represented by R1 or R2 may be the same as or different from each other; and n is 0, and wherein a content of the at least one ester is 10 ppm to 1000 ppm by mass, based on a mass of the processing liquid.
地址 Tokyo JP