SUBSTRATE PROCESSING APPARATUS AND METHOD

摘要

A substrate processing apparatus and a substrate processing method are provided. The substrate processing apparatus includes a substrate processing unit which processes a substrate with the processing solutions of a first source and a second source, a source supply unit which supplies the first source and the second source to the substrate processing unit, analyzers which detect the density of the second source in the processing solution or the PH of the processing solutions and corrects the measurement reference value of the second source with a standard solution, and a standard solution supply unit which manufactures the standard solution by receiving the first source and the second source from the source supply unit and supplies the standard solution to the analyzer.