| 发明名称 |
NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION |
| 摘要 |
[Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that.;[Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking. |
| 申请公布号 |
US2015331319(A1) |
申请公布日期 |
2015.11.19 |
| 申请号 |
US201314388189 |
申请日期 |
2013.04.05 |
| 申请人 |
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. |
发明人 |
Yokoyama Daishi;Noya Atsuko;Tashiro Yuji;Yoshida Naofumi;Tanaka Yasuaki;Fuke Takashi;Takahashi Megumi;Taniguchi Katsuto;Nonaka Toshiaki |
| 分类号 |
G03F7/075 |
主分类号 |
G03F7/075 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A negative-working photosensitive siloxane composition, comprising
a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. |
| 地址 |
Somerville NJ US |
