| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing process of a display device by which electrostatic breakdown of an element is prevented or reduced.SOLUTION: According to one aspect, a substrate for display device comprises an insulation substrate, and a conductive film formed at least on one principal surface of the insulation substrate. For the substrate for display device, a first etching rate of the conductive film of etching with hydrofluoric acid aqueous solution containing fluoride hydrogen at concentration of 10% or more is substantially equal to a second etching rate of the etching of the insulation substrate, or the first etching rate is larger than the second etching rate. |
