发明名称 DECOUPLING CAPACITOR AND METHOD OF MAKING SAME
摘要 A semiconductor substrate has at least two active regions, each having at least one active device that includes a gate electrode layer, and a shallow trench isolation (STI) region between the active regions. A decoupling capacitor comprises first and second dummy conductive patterns formed in the same gate electrode layer over the STI region. The first and second dummy conductive regions are unconnected to any of the at least one active device. The first dummy conductive pattern is connected to a source of a first potential. The second dummy conductive pattern is connected to a source of a second potential. A dielectric material is provided between the first and second dummy conductive patterns.
申请公布号 US2015333054(A1) 申请公布日期 2015.11.19
申请号 US201514808040 申请日期 2015.07.24
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 CHEN Chung-Hui
分类号 H01L27/06;H01L27/02;H01L23/522;H01L29/73;H01L29/06;H01L49/02 主分类号 H01L27/06
代理机构 代理人
主权项 1. A structure comprising: a semiconductor substrate having: at least two active regions, each having at least one active device that includes a gate electrode layer, anda shallow trench isolation (STI) region between the active regions; and a capacitor comprising: first and second dummy conductive patterns formed in the gate electrode layer over the STI region; anda dielectric material between the first and second dummy conductive patterns.
地址 Hsin-Chu TW