IMPRINT MOLD, BLANK FOR IMPRINT MOLD, METHOD FOR MANUFACTURING IMPRINT MOLD SUBSTRATE, AND METHOD FOR MANUFACTURING IMPRINT MOLD

摘要

PROBLEM TO BE SOLVED: To provide an imprint mold capable of removing a fine uneven pattern by polishing treatment without worsening flatness of an upper surface of a convex structure part, blank for imprint mold, a method for manufacturing an imprint mold substrate, and a method for manufacturing an imprint mold.SOLUTION: An imprint mold 1 comprises a base part 2 including a first surface 2A and a second surface 2B facing the first surface 2A, a convex structure part 3 and a convex part 4 protruding from the first surface 2A, and a fine uneven pattern 5 formed on an upper surface 3A of the convex structure part 3. The convex part 4 is located around the convex structure part 3 in a plan view from the first surface 2A side. The height Tof the convex part 4 is substantially the same as the height Tof the convex structure part 3.