| 摘要 |
PROBLEM TO BE SOLVED: To achieve delustured ornamental design without using a surface processing method for setting a mat face and adding solvent resistance to a low gloss part, and to provide an ink composition retaining delustured ornamental design utilizing pattern of backing and a laminate coating film delustured laminate coating film using the ink.SOLUTION: There is provided a reactive resin ink composition for low gloss ornamental design containing a reactive polyurethane resin having a weight average molecular weight of 10000 to 100000 and a terminal having a hydroxyl group and/or an amino group obtained by reacting diisocyanate, polybutadiene polyol and aliphatic diol having a weight average molecular weight of 700 to 6000 excluding polybutadiene polyol (a1), aliphatic diol having the weight average molecular weight of 500 or less, and primary and/or secondary amino group-containing compound (a3) as an essential component. |
