| 摘要 |
The invention relates to a projection exposure system for semiconductor lithography having a deformable optical element for correcting wave front errors, wherein for the deformation of the optical element, actuating units are provided, which are in mechanical contact with the optical element by way of contact regions. The contact regions (36) are arranged in a regular or irregular arrangement outside of an optically active area (9.16', 9.17', 9.19', 9.20', 9.21') of the optical element (9.16, 9.17, 9.19, 9.20, 9.21), wherein contact regions (36) located in close proximity to the optically active area, or further away therefrom, are present. |
