| 摘要 |
The purpose of the present invention is to provide: a compound containing a modified phenolic hydroxy group, which has excellent photosensitivity and heat resistance; a photosensitive composition containing the compound; a resist material comprising the photosensitive composition; and a coating film comprising the resist material. The present invention provides a compound containing a modified phenolic hydroxy group, which comprises a molecular structure represented by general formula (1) [wherein R1 represents a tertiary alkyl group, an alkoxyalkylgroup, an aryloxyalkyl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a cyclic aliphatic hydrocarbon group containing a hetero atom, or a trialkylsilyl group; R2 represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group which may have a substituent, an aralkyl group which may have a substituent, or a halogen atom; and R3 represents an alkyl group which may have a substituent, or an aryl group which may have a substituent] (wherein a molecular structure represented by general formula (2) is excluded). |
