发明名称 IMPLANT FOR SUBSTANCE DOSAGE AND IMPLANT PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an implant for dosage of an effective substance, e.g. minor minerals necessary for health physiological functions.SOLUTION: An implant (60) using a porous silicon is impregnated with an effective substance, e.g. minor minerals necessary for health physiological functions, and grafted in the subcutaneous to allow complete corrosion over several months and/or years for controlled release of the minor minerals. In a second embodiment, an implant (62) is a reservoir type porous implant which contains an effective substance and includes a large number of holes (72) closed with biological erosive doors (76 and 78) different in thickness so as to yield a time difference in long-time release of the effective substance after breaks of the doors.
申请公布号 JP2015205185(A) 申请公布日期 2015.11.19
申请号 JP20150094005 申请日期 2015.05.01
申请人 PSIMEDICA LTD 发明人 CANHAM TREVOR LEIGH;BARRETT CHRISTOPHER PAUL;BOWDITCH ANDREW PAUL;COX TIMOTHY INGRAM;WRIGHT PETER JOHN
分类号 A61L31/00;A61K9/00;A61K31/00;A61K33/00;A61K47/02;A61K47/04;A61K47/34;A61L27/00 主分类号 A61L31/00
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