发明名称 |
PROCESS, FILM, AND APPARATUS FOR TOP CELL FOR A PV DEVICE |
摘要 |
This disclosure describes systems and methods for making at least a portion of a photovoltaic device. This may include a method of manufacturing, an optimization procedure and an apparatus for the PECVD (plasma enhanced chemical vapor deposition) of thin films over large area substrates. In particular, the system may be used to deposit thin film silicon material for photovoltaic (PV) applications. The photovoltaic device may be achieved by a combination of plasma chamber design (e.g., inter-electrode separation) and plasma process parameters (e.g., pressure, applied RF voltage, etc.) to optimize the doped and/or intrinsic layers of the solar cell (e.g., p-i-n junction). |
申请公布号 |
WO2015048501(A3) |
申请公布日期 |
2015.11.19 |
申请号 |
WO2014US57793 |
申请日期 |
2014.09.26 |
申请人 |
TEL SOLAR AG;TOKYO ELECTRON U.S. HOLDINGS, INC. |
发明人 |
SALABAS, ELENA LORENA;KUEGLER, EDUARD;PRIGENT, CHLOE;SALABAS, AUREL |
分类号 |
H01L31/00 |
主分类号 |
H01L31/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|