发明名称 |
COBALT COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD FOR PRODUCING THIN FILM |
摘要 |
A cobalt compound according to the present invention is represented by general formula (I). In general formula (I), R1 to R3 independently represent a linear or branched alkyl group having 1 to 5 carbon atoms. A raw material for forming a thin film according to the present invention contains the cobalt compound represented by general formula (I). The present invention can provide: a cobalt compound which has a low melting point and therefore can be transported in a liquid state and can be decomposed at a low temperature, and also has a high vapor pressure and therefore can be vaporized readily; and a raw material for forming a thin film, which is prepared using the cobalt compound. |
申请公布号 |
WO2015174153(A1) |
申请公布日期 |
2015.11.19 |
申请号 |
WO2015JP60131 |
申请日期 |
2015.03.31 |
申请人 |
ADEKA CORPORATION |
发明人 |
YOSHINO, TOMOHARU;ENZU, MASAKI;SAKURAI, ATSUSHI;HATASE, MASAKO;UCHIUZOU, HIROYUKI;NISHIDA, AKIHIRO |
分类号 |
C07F15/06;C23C16/18;H01L21/316 |
主分类号 |
C07F15/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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