发明名称 CLEANING SOLVENT, CLEANING EQUIPMENT, AND METHOD FOR CLEANING MOUNTING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a cleaning solvent, cleaning equipment, and a method for cleaning a mounting substrate which enable the execution of high-quality cleaning even with a novel solder, such as a lead-free solder.SOLUTION: A cleaning solvent 2 is used to clean a mounting substrate 10. The cleaning solvent 2 is a chemical solution comprising: a hydrocarbon based solvent containing ketone or aromatics; organic amines included in the solvent; and an anhydrous unsaturated carboxylic acid compound or an anhydrous carboxylic acid added to the solvent. The organic amines include at least one kind of diethanolamine and trimethylamine, which are a secondary or tertiary amine. That is, the cleaning solvent 2 includes at least one kind of dehydrated unsaturated carboxylic acid compounds (e.g. anhydrous abietic acid and anhydrous neoabietic acid), and dehydrated dicarboxylic acids (e.g. formic acid, anhydrous acetic acid, and anhydrous valerianic acid). The amine components are equal to or less than the carboxylic acids in chemical equivalent.
申请公布号 JP2015207712(A) 申请公布日期 2015.11.19
申请号 JP20140088461 申请日期 2014.04.22
申请人 MITSUBISHI ELECTRIC CORP 发明人 KAMO YOSHIYUKI;KINUGAWA MASARU
分类号 H05K3/34;B08B3/02;B08B3/04;B08B3/08;C11D7/26;C11D7/32;C11D7/50;H05K3/26 主分类号 H05K3/34
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