发明名称 ガスバリアーフィルム及びその製造方法
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film that suppresses adhesion and gas barrier performance from deteriorating even in a high-temperature, high-humidity environment.SOLUTION: A gas barrier film (1) according to the present invention is characterized in that a carbon distribution curve among distribution curves of constituent elements based upon depth-directional element distribution measurement by X-ray photoelectron spectroscopy of a gas barrier layer (3) has at least six maximal values, wherein a linear function expression of y=ax+b has a gradient "a" of 0.03-0.70, the linear function expression being derived in a least square method from each of carbon atomic ratios (y) at two arbitrary maximal values present in a region on the opposite side from a base material (2) from a surface of the gas barrier layer (3) to 1/3 of a layer thickness of the bas barrier layer (3), at two arbitrary maximal values present in a region from 1/3 to 2/3, and at two arbitrary maximal values present in a region from 2/3 to the base material (2), and a distance (x) from the surface.
申请公布号 JP2015206096(A) 申请公布日期 2015.11.19
申请号 JP20140088872 申请日期 2014.04.23
申请人 发明人
分类号 C23C16/42;B32B9/00;B32B27/00 主分类号 C23C16/42
代理机构 代理人
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