发明名称 APPARATUS AND METHOD FOR EXPOSURE AND DEVICE PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To measure positional information of a stage by switching a head mounted on the stage.SOLUTION: A control system controls a drive system so that a stage WST1 is moved from one of regions A, A, Aand Ato another of the regions A, A, Aand Athrough a region A. Instead of drive control of the stage with three of four heads 60, 60, 60and 60used in the above region, drive control of the stage with three heads used in another region is conducted by using correction information for compensating measurement errors produced by conducting drive control of the stage with the three heads used in another region. The correction information is acquired from positional information obtained from four heads while the stage stays in the region A.
申请公布号 JP2015207013(A) 申请公布日期 2015.11.19
申请号 JP20150121609 申请日期 2015.06.17
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 G03F7/20;G01B11/00;H01L21/68 主分类号 G03F7/20
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