| 摘要 |
PROBLEM TO BE SOLVED: To provide an alkoxide compound having no pyrophoric property and high thermostability and useful as a raw material for forming a thin film by an ALD method.SOLUTION: There is provided an alkoxide compound represented by the following general formula (I). In the formula (I), Rto Rrepresent each independently a hydrogen, a hydrocarbon group having 1 to 12 carbon atoms, Rrepresents a hydrocarbon group having 1 to 12 carbon atoms or the like, L represents hydrogen, halogen, a hydroxyl group, an amino group, an azide group, a phosphide group, a nitrile group, a carbonyl group, a hydrocarbon group having 1 to 12 carbon atoms or the like, M represents a metal atom or a silicon atom, n represents an integer of 1 or more, m represents an integer of 0 or more, and n+m represents the valence of the metal atom or the silicon atom. |
