发明名称 ELECTRON BEAM RECORDING APPARATUS
摘要 <p>An electron beam recording apparatus is disclosed that records information onto the surface of a sample by using an electron beam. The electron beam recording apparatus includes an electron source that irradiates the electron beam, a magnetic detector that is configured to move onto and out of an irradiation axis and acquires magnetic information on the irradiation axis, a convergence position control part that calculates a convergence position correction amount for correcting a convergence position of the electron beam with respect to the surface of the sample based on the magnetic information, and a convergence position adjusting part that adjusts the convergence position of the electron beam with respect to the surface of the sample. The convergence position control part causes the convergence position adjusting part to adjust the convergence position of the electron beam with respect to the surface of the sample based on the convergence position correction amount.</p>
申请公布号 EP2008276(B1) 申请公布日期 2015.11.18
申请号 EP20070738777 申请日期 2007.03.12
申请人 RICOH COMPANY, LTD.;CRESTEC CORPORATION 发明人 OBARA, TAKASHI;MIYAZAKI, TAKESHI
分类号 G11B7/26;G11B9/10;G11B11/03 主分类号 G11B7/26
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