发明名称 投影光学系、露光装置及びデバイス製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a projection optical system in which the pattern of an original is projected onto a substrate while reducing the influence of planarity of a substrate by adjusting the focus position of the projection optical system. <P>SOLUTION: A projection optical system of the present invention that projects the image of the pattern of an original onto a substrate includes a plurality of optical transmission elements. The plurality of optical transmission elements have continuous surface shapes having periods different from each other. Focus is adjusted by shifting at least one of the plurality of optical transmission elements in the periodic direction. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP5818424(B2) 申请公布日期 2015.11.18
申请号 JP20100268754 申请日期 2010.12.01
申请人 キヤノン株式会社 发明人 大阪 昇
分类号 G03F7/20;G02B7/04;G02B17/02;G03F9/02 主分类号 G03F7/20
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