发明名称 RADICAL SOURCE AND MOLECULAR BEAM EPITAXY APPARATUS
摘要 [Object] To provide a radical generator which can produce radicals at higher density. [Means for Solution] The radical generator includes a supply tube 10 made of SUS, a hollow cylindrical plasma-generating tube 11 which is connected to the supply tube 10 and which is made of pyrolytic boron nitride (PBN). A cylindrical CCP electrode 13 is disposed outside the plasma-generating tube 11. A coil 12 is provided so as to wind about the outer circumference of the plasma-generating tube at the downstream end of the CCP electrode 13. A parasitic-plasma-preventing tube 15 made of a ceramic material is inserted into an opening of the supply tube 10 at the connection site between the supply tube 10 and the plasma-generating tube 11.
申请公布号 EP2610895(B1) 申请公布日期 2015.11.18
申请号 EP20110819589 申请日期 2011.08.24
申请人 NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY;NU ECO ENGINEERING CO., LTD.;KATAGIRI ENGINEERING CO., LTD. 发明人 HORI, MASARU;AMANO, HIROSHI;KANO, HIROYUKI;DEN, SHOJI;YAMAKAWA, KOJI
分类号 H01L21/203;C23C14/24;C30B23/02;C30B23/08;H05H1/24 主分类号 H01L21/203
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