| 摘要 |
The invention provides a sample holder, which can improve film thickness and distribution of a film formed on a substrate in a film forming and processing step by means of a plasma chemical vapor deposition method. The sample holder is stored in a plasma processing apparatus and is arranged at a position opposite to an electrode in the shape of comb teeth and is provided with a loading face extending along a direction vertical to the loading area of the substrate defining a loading and processing object. The corner part of the outer edge of the loading face undergoes C cornering or R cornering. |
