APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

摘要

According to one embodiment of the present invention, a substrate treatment device comprises: a chamber, wherein a substrate is conveyed through a passage formed on one side and a supply port supplying a gas toward the substrate is formed on the opposite side of the passage, having an inner space where the substrate is processed; an auxiliary susceptor installed in the inner space to have a shape corresponding to the inner space and having an opening; and a main susceptor inserted into the opening to be rotated while the substrate is placed and heating the substrate.