Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus

摘要

A charged particle beam exposure apparatus which exposes a substrate using a plurality of charged particle beams comprises a first measurement member (14: 141, 142) for making the plurality of charged particle beams come incident and measuring a total current value of the charged particle beams, and a second measurement member (15: 151, 152) for making the plurality of charged particle beams come incident and multiplying electrons of each of the incident charged particle beams, thereby measuring a relative value of a current of each of the charged particle beams.