发明名称 DEFECT INSPECTION SYSTEM BASED ON ANALYSIS OF IMAGE AND METHOD THEREOF
摘要 Provided is a defect inspection system based on image analysis. According to an embodiment of the present invention, a defect inspection system based on the image analysis comprises: a calculation unit to calculate one or more feature values for each inspection target area by analyzing each feature of at least one inspection target area which is designated; a selection unit to select a defect inspection method capable of being applied to each of the inspection target areas which are designated among multiple defect inspection methods stored in advance; and a providing unit to provide a list of the selected defect inspection methods for at least one inspection target area which is designated. The selection unit selects the defect inspection method capable of being applied to at least one inspection target area which is designated by comparing an application condition profile which is designated for each of the defect inspection methods with the calculated feature value. Each title of the defect inspection method of the selected defect inspection list includes a defect title for a defect.
申请公布号 KR20150128318(A) 申请公布日期 2015.11.18
申请号 KR20140055522 申请日期 2014.05.09
申请人 SAMSUNG TECHWIN CO., LTD. 发明人 CHA, JUN HO;KIM, JI HO;JEONG, JAE HO
分类号 G01N21/95;G01N21/958 主分类号 G01N21/95
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