Positive photosensitive resin composition and uses thereof

摘要

The invention relates to a positive photosensitive resin composition without color off after etching. The invention also provides a method for manufacturing a thin-film transistor array substrate, a thin-film transistor array substrate and a liquid crystal display device.

主权项

1. A positive photosensitive resin composition comprising:
a novolac resin (A); an ortho-naphthoquinone diazide sulfonic acid ester (B); a dye (C); and a solvent (D); wherein the novolac resin (A) is obtained by polycondensing a cresol aromatic hydroxyl compound with an aldehyde; based on 100% of the integral area of the molecular weight of the novolac resin (A) measured by the gel permeation chromatography, the area of the cresol dimer in the novolac resin (A) ranges from 0.5% to 6%; the dye (C) comprises a dye (C-1) and a dye (C-2), and the dye (C-1) is selected from the group consisting of a disazo dye, an anthraquinone dye, and a trivalent chromium azo dye; and the dye (C-2) is a triarylmethane dye; wherein the amount of the dye (C) used is from 10 to 100 parts by weight; the amount of the dye (C-1) used is from 3 to 15 parts by weight; and the amount of the dye (C-2) used is from 2 to 9 parts by weight based on 100 parts by weight of the novolac resin (A) used; wherein the ratio of the amount of the dye (C-1) used and the amount of the dye (C-2) used is from 1 to 10.