发明名称 composicao adesiva fotossensivel, adesivo em pelicula fotossensevel, padrao adesivo, wafer semicondutor com adesivo, dispositivo semicondutor e componente eletronico
摘要 A photosensitive adhesive composition that can form an adhesive layer on an adherend and allows an adhesive pattern to be formed by exposure treatment with radiation and developing treatment with a developing solution, the photosensitive adhesive composition having solubility and developability, and the film thickness T 1 (µm) of the adhesive pattern formed after development satisfying the conditions represented by the following expression (1). T 1 / T 0 × 100 ‰¥ 90 [In expression (1), T 0 represents the film thickness (µm) of the adhesive layer before developing treatment.]
申请公布号 BRPI0917383(A2) 申请公布日期 2015.11.17
申请号 BR2009PI17383 申请日期 2009.08.26
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 KAZUYUKI MITSUKURA;SHIGEKI KATOGI;TAKASHI KAWAMORI;TAKASHI MASUKO
分类号 C09J4/02;C09J7/00;C09J7/02;C09J163/00;C09J179/08;C09J201/00;C09J201/06;H01L21/52 主分类号 C09J4/02
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