| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for providing a fine mask pattern having a thin residual film on the surface of an inorganic substrate, and then accurately manufacturing a fine pattern having a high aspect ratio on the surface of the inorganic substrate. <P>SOLUTION: A method for manufacturing a fine pattern formed in one main face side of an inorganic substrate includes: sticking a mask material layer side of a laminate A obtained by laminating a mask material layer on a photocurable resin layer of a reel-shaped resin mold including a light-transmitting substrate and a photocurable resin layer which is provided on the substrate and has a fine uneven structure thereon, to a resin layer side of a laminate B obtained by forming a resin layer on the inorganic substrate; then curing the stuck resin layer; and obtaining a laminate including mask material layer-resin layer-inorganic substrate obtained by transferring an uneven structure obtained by separation of the reel-shaped resin mold onto the mask material layer by continuous etching. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
