发明名称 Systems and devices including fin field-effect transistors each having U-shaped semiconductor fin
摘要 Disclosed are methods, systems and devices, including a system, having a memory device. In some embodiments, the memory device includes a plurality of fin field-effect transistors disposed in rows, a plurality of insulating fins each disposed between the rows, and a plurality of memory elements each coupled to a terminal of a fin field-effect transistor among the plurality of fin field-effect transistors.
申请公布号 US9190494(B2) 申请公布日期 2015.11.17
申请号 US200812033799 申请日期 2008.02.19
申请人 Micron Technology, Inc. 发明人 Juengling Werner
分类号 H01L29/76;H01L29/66;H01L21/8234;H01L27/088;H01L27/108;H01L29/78;H01L21/336;H01L21/76 主分类号 H01L29/76
代理机构 Fletcher Yoder, P.C. 代理人 Fletcher Yoder, P.C.
主权项 1. A device, comprising: fin field-effect transistors disposed in rows, wherein each of the fin field-effect transistors comprises a semiconductor fin comprising a generally U-shaped distal portion with two legs comprising a source and a drain of each of the fin field-effect transistors, wherein the two legs define a gap therebetween, wherein the two legs and the gap are aligned such that a drive current generated between the source and the drain flows in a direction parallel to alignment of the rows; an insulator disposed solely in the gap of the semiconductor fin of each of the fin field-effect transistors; and insulating fins each disposed in a second gap defined between the fin field-effect transistors disposed in the rows.
地址 Boise ID US