| 发明名称 | Imprint apparatus, imprint method, and device manufacturing method | ||
| 摘要 | An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element. | ||
| 申请公布号 | US9188855(B2) | 申请公布日期 | 2015.11.17 |
| 申请号 | US201213469829 | 申请日期 | 2012.05.11 |
| 申请人 | CANON KABUSHIKI KAISHA | 发明人 | Maeda Hironori;Miura Seiya;Mishima Kazuhiko;Minoda Ken |
| 分类号 | B29C59/02;G03F7/00;G03F9/00;B82Y10/00;B82Y40/00 | 主分类号 | B29C59/02 |
| 代理机构 | Canon USA, Inc. IP Division | 代理人 | Canon USA, Inc. IP Division |
| 主权项 | 1. An imprint apparatus configured to form a pattern to an imprint material on a substrate by using a mold, the imprint apparatus comprising: a light-receiving element; a detection system configured to guide light from a mark formed on the substrate and a mark formed on the mold to the light-receiving element; and a relay optical system, wherein the relay optical system is configured to form images of the light from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system, and wherein the detection system is configured to guide the light from the relay optical system to the light-receiving element. | ||
| 地址 | Tokyo JP | ||