发明名称 Method and apparatus for producing semiconductor crystal, and semiconductor crystal
摘要 A method of producing a semiconductor crystal is provided. The method includes the steps of preparing a longitudinal container with a seed crystal and an impurity-containing melt placed in a bottom section and with a suspension part arranged in an upper section and suspending a dropping raw material block made of a semiconductor material having an impurity concentration lower than the impurity concentration of the impurity-containing melt, and creating a temperature gradient in the longitudinal direction of the longitudinal container to melt the dropping raw material block, and solidifying the impurity-containing melt from the side that is in contact with the seed crystal (8) while dropping a produced melt into the impurity-containing melt, thereby producing a semiconductor crystal.
申请公布号 US9187843(B2) 申请公布日期 2015.11.17
申请号 US201013384922 申请日期 2010.07.23
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 Sakurada Takashi;Kawase Tomohiro
分类号 C30B15/00;C30B15/02;C30B15/20;C30B15/14;C30B11/06;C30B29/40;C30B29/42;C30B29/44 主分类号 C30B15/00
代理机构 Drinker Biddle & Reath LLP 代理人 Drinker Biddle & Reath LLP
主权项 1. A method of producing a semiconductor crystal by placing a seed crystal and a melt containing an impurity in a longitudinal container and solidifying said impurity-containing melt from a lower side that is in contact with said seed crystal to an upper side, wherein said semiconductor crystal is produced by solidifying said impurity-containing melt from the lower side that is in contact with said seed crystal to the upper side while dropping, into said seed crystal and said impurity-containing melt placed in a bottom section of said longitudinal container, a melt of a dropping raw material block suspended above said bottom section and made of a semiconductor material having an impurity concentration lower than an impurity concentration of said impurity-containing melt, and ((1−k)−0.25)≦S1/S2≦((1−k)+0.25) is satisfied where S1 represents a horizontal cross sectional area of said dropping raw material block, S2 represents a horizontal cross sectional area of said semiconductor crystal, and k represents a segregation coefficient of the impurity contained in said impurity-containing melt.
地址 Osaka-shi, Osaka JP