发明名称 |
Method and apparatus for producing semiconductor crystal, and semiconductor crystal |
摘要 |
A method of producing a semiconductor crystal is provided. The method includes the steps of preparing a longitudinal container with a seed crystal and an impurity-containing melt placed in a bottom section and with a suspension part arranged in an upper section and suspending a dropping raw material block made of a semiconductor material having an impurity concentration lower than the impurity concentration of the impurity-containing melt, and creating a temperature gradient in the longitudinal direction of the longitudinal container to melt the dropping raw material block, and solidifying the impurity-containing melt from the side that is in contact with the seed crystal (8) while dropping a produced melt into the impurity-containing melt, thereby producing a semiconductor crystal. |
申请公布号 |
US9187843(B2) |
申请公布日期 |
2015.11.17 |
申请号 |
US201013384922 |
申请日期 |
2010.07.23 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
Sakurada Takashi;Kawase Tomohiro |
分类号 |
C30B15/00;C30B15/02;C30B15/20;C30B15/14;C30B11/06;C30B29/40;C30B29/42;C30B29/44 |
主分类号 |
C30B15/00 |
代理机构 |
Drinker Biddle & Reath LLP |
代理人 |
Drinker Biddle & Reath LLP |
主权项 |
1. A method of producing a semiconductor crystal by placing a seed crystal and a melt containing an impurity in a longitudinal container and solidifying said impurity-containing melt from a lower side that is in contact with said seed crystal to an upper side, wherein
said semiconductor crystal is produced by solidifying said impurity-containing melt from the lower side that is in contact with said seed crystal to the upper side while dropping, into said seed crystal and said impurity-containing melt placed in a bottom section of said longitudinal container, a melt of a dropping raw material block suspended above said bottom section and made of a semiconductor material having an impurity concentration lower than an impurity concentration of said impurity-containing melt, and ((1−k)−0.25)≦S1/S2≦((1−k)+0.25) is satisfied where S1 represents a horizontal cross sectional area of said dropping raw material block, S2 represents a horizontal cross sectional area of said semiconductor crystal, and k represents a segregation coefficient of the impurity contained in said impurity-containing melt. |
地址 |
Osaka-shi, Osaka JP |