发明名称 描画装置、光学ユニット及び描画装置の調整方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a technique which reduces the frequency of replacement of a spatial light modulator by prolonging an available time of the spatial light modulator. <P>SOLUTION: The drawing device 100 comprises an optical unit 40. Light radiated from a laser oscillator 41 provided in the optical unit 40 is introduced into a spatial light modulator 441 via an illumination optical system 43. The spatial light modulator 441 spatially modulates incident light L1 entering into an effective reflection surface ER as a part of an entire reflection surface 420f. By performing a pattern drawing for a predetermined time, an instruction of a controller 90 displaces a location of an illumination system focus lens 435 included in the illumination optical system 43. Therefore an incident position of the incident light L1 incoming on the effective reflection surface ER is displaced, and an incident region NR1 formed on the effective reflection surface ER is shifted to a region on the effective reflection surface ER where the light is not radiated. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP5813961(B2) 申请公布日期 2015.11.17
申请号 JP20110027504 申请日期 2011.02.10
申请人 株式会社SCREENホールディングス 发明人 山口 和彦;小八木 康幸;藤澤 泰充;茂野 幸英
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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