发明名称 |
Die edge contacts for semiconductor devices |
摘要 |
A semiconductor device utilizing die edge contacts is provided. An integrated circuit die has a post-passivation layer with a trench filled with a conductive material extending from a contact to a die edge, thereby forming a die edge contact. Optionally, a through substrate via may be positioned along the die edge such that the conductive material in the trench is electrically coupled to the through-substrate via, thereby forming a larger die edge contact. The integrated circuit die may be placed in a multi-die package wherein the multi-die package includes walls having a major surface perpendicular to a major surface of the integrated circuit die. The die edge contacts are electrically coupled to contacts on the walls of the multi-die package. The multi-die package may include edge contacts for connecting to another substrate, such as a printed circuit board, a packaging substrate, a high-density interconnect, or the like. |
申请公布号 |
US9190347(B2) |
申请公布日期 |
2015.11.17 |
申请号 |
US201313967165 |
申请日期 |
2013.08.14 |
申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
Lai Yi-Jen;Chou You-Hua;Huang Hon-Lin;Yang Huai-Tei |
分类号 |
H01L23/48;H01L21/768;H01L25/065;H01L25/00;H01L23/00;H01L25/18 |
主分类号 |
H01L23/48 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A semiconductor structure comprising:
an integrated circuit substrate having a contact pad formed thereon; a passivation layer formed over the integrated circuit substrate, the passivation layer exposing at least a portion of the contact pad and having a trench from the contact pad to an outermost edge of the passivation layer; and a conductive material filling the trench of the passivation layer to form a die-edge contact. |
地址 |
Hsin-Chu TW |