| 摘要 |
PROBLEM TO BE SOLVED: To provide means capable of exhibiting a good gas barrier property in a gas barrier film having a protective film used for an electronic device.SOLUTION: There is provided a method for producing a gas barrier film which comprises: a first step of applying a coating liquid containing a polysilazane compound on a substrate and followed by performing reforming treatment to form a gas barrier layer; and a second step of adhering the protective film on the gas barrier layer via an adhesive layer to form a gas barrier film and winding up the gas barrier film in a roll state, where in the second step, the surface pressure applied to the gas barrier film when wound up in a roll state is 0.05 MPa or more and 1.5 MPa or less. |
