| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus advantageous for carrying out a patterned substrate in an order different from the carry-in order.SOLUTION: A lithography apparatus for patterning a substrate has processing means 115 for mapping the order information, indicating the carry-in order thereof, respectively, to a plurality of substrates carried in sequentially from a first external device 101, a plurality of units 102 for patterning the plurality of substrates in parallel, respectively, and transmission means 108 for transmitting the order information corresponding to a substrate, out of the plurality of substrates being patterned in any one of the plurality of units and carried out, to a second external device 104. |
