发明名称 INSTALLATION METHOD OF PHOTOSENSITIVE FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE FILM, ELECTRO-OPTIC DEVICE AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method of installing a resist film, with good shape accuracy, in a region of thin film thickness.SOLUTION: An installation method of a photosensitive film has a step for installing a photosensitive film 15 on a substrate body 10, exposing by using a halftone mask 30 having a light transmittance of three gray scale or more, and developing the photoresist film 15. The photoresist film 15 after development has a first photoresist film 16 and a second photoresist film 17 thicker than the first photoresist film 16, and the second photoresist film 17 is installed in a place of the substrate body 10 where it can be installed without removing the photoresist film 15.
申请公布号 JP2015204351(A) 申请公布日期 2015.11.16
申请号 JP20140082547 申请日期 2014.04.14
申请人 SEIKO EPSON CORP 发明人 SERA HIROSHI;NAKAJIMA YOSHIKI
分类号 H01L21/266;G02F1/1368;G03F1/00;G09F9/30;H01L21/336;H01L29/786 主分类号 H01L21/266
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