发明名称 |
INSTALLATION METHOD OF PHOTOSENSITIVE FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE FILM, ELECTRO-OPTIC DEVICE AND ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of installing a resist film, with good shape accuracy, in a region of thin film thickness.SOLUTION: An installation method of a photosensitive film has a step for installing a photosensitive film 15 on a substrate body 10, exposing by using a halftone mask 30 having a light transmittance of three gray scale or more, and developing the photoresist film 15. The photoresist film 15 after development has a first photoresist film 16 and a second photoresist film 17 thicker than the first photoresist film 16, and the second photoresist film 17 is installed in a place of the substrate body 10 where it can be installed without removing the photoresist film 15. |
申请公布号 |
JP2015204351(A) |
申请公布日期 |
2015.11.16 |
申请号 |
JP20140082547 |
申请日期 |
2014.04.14 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SERA HIROSHI;NAKAJIMA YOSHIKI |
分类号 |
H01L21/266;G02F1/1368;G03F1/00;G09F9/30;H01L21/336;H01L29/786 |
主分类号 |
H01L21/266 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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