负型光阻组成物，使用该负型光阻组成物之凸纹图案之制造方法及电子零件;NEGATIVE RESIST COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING THE RESIST COMPOSITION, AND ELECTRONIC COMPONENT

摘要

本发明提供一种于藉由电子束或EUV之照射的图案形成中，感度较高且解像力较高，可获得低线边缘粗糙度之图案的负型光阻组成物，使用该光阻组成物之凸纹图案之制造方法及电子零件。;本发明之负型光阻组成物含有酚性化合物(A)，该酚性化合物(A)于1分子中具有2个以上之酚性羟基，且1分子中于酚性羟基之邻位具有1个以上自羟基甲基、及烷氧基甲基所组成之群组中选择的1种以上之取代基，分子量为400~2500，上述酚性化合物(A)于该负型光阻组成物之全部固形份中之含量为70重量%以上。;The negative resist composition comprises a phonolic compound (A) having a molecular weight of 400 to 2,500, two or more phenolic hydroxyl groups in a molecule thereof, and one or more substituents of one or more kinds selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group in an ortho position of the phenolic hydroxyl groups in a molecule thereof. A content of the phonolic compound (A) is 70% by weight or more of the total solid content of the negative resist composition.