发明名称 PROCESSING METHOD OF MULTILAYER SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a processing method of a multilayer substrate capable of reducing a chip defect caused by exfoliation of a first substrate regardless of a workpiece.SOLUTION: The processing method of the multilayer substrate in which a second substrate is stuck on the first substrate via an adhesive layer and a plurality of streets each having a predetermined width are set includes a laser processing groove forming step and a cutting step. In the laser processing groove forming step, the multilayer substrate is irradiated with a laser beam of a wavelength having absorptivity from a side of the second substrate along the streets and a pair of laser processing grooves each reaching the first substrate are formed at both sides within the width of the streets. After the laser processing groove forming step is implemented, in the cutting step, a region held between the pair of laser processing grooves within the street is cut by a cutting blade of which the width does not protrudes from the pair of laser processing grooves.
申请公布号 JP2015204314(A) 申请公布日期 2015.11.16
申请号 JP20140081541 申请日期 2014.04.11
申请人 DISCO ABRASIVE SYST LTD 发明人 KUMAZAWA SATORU
分类号 H01L21/301;B23K26/364;B24B27/06 主分类号 H01L21/301
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