发明名称 DEVICE AND METHOD FOR EXHAUST GAS PURIFICATION IN CVD REACTOR
摘要 PROBLEM TO BE SOLVED: To provide a device including a reactor into which process gases different from one another are fed, the device causing no cross-flow from one another in cases when different exhaust gas devices are switched to be used for the different process gases, respectively.SOLUTION: A device including a reactor 3 includes: first and second exhaust gas devices 10, 20 which can be connected by means of valve arrangements 11, 21 optionally to an exhaust gas line 5 in a fluidly communicable and separable manner, and used for different process gases, respectively; and pressure sensors 13, 23 for determining respective total pressures P, Pin both the exhaust gas devices 10, 20. The device is provided with a control device 9. A control variable of the control device 9 is the pressure difference between the total pressures P, Pin both the exhaust gas devices 10, 20 and is designed such that the pressure difference is regulated to approximately zero at least during switching of the valve arrangements 11, 21.
申请公布号 JP2015204461(A) 申请公布日期 2015.11.16
申请号 JP20150080976 申请日期 2015.04.10
申请人 AIXTRON SE 发明人 PATRICK FRANKEN;MARKUS DEUFEL
分类号 H01L21/31;C23C16/44 主分类号 H01L21/31
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