| 摘要 |
PROBLEM TO BE SOLVED: To provide a silicon wafer polishing composition superior in the effect of reducing haze, and filterability.SOLUTION: Provided is a silicon wafer polishing composition which comprises: a polymer X including an amide group; and an organic compound Y including no amide group. The polymer X including an amide group has, in its main chain, a constitutional unit A originating from a monomer expressed by the general formula (1) below. The relation between the molecular weight Mof the polymer X including an amide group, and the molecular weight Mof organic compound Y satisfies the following expression: 200≤M<M. |
