SUBSTRATE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment method that reduces flaws on a substrate surface.SOLUTION: The substrate treatment method includes: a step of polishing a surface of a polishing object provided on the substrate W on a polishing pad 3 to which slurry is supplied from a slurry supply part 5; a step of polishing the surface of the polishing object on the polishing pad 3 while supplying water to the polishing pad 3 from a water supply part 6 after the polishing step using the slurry; and a step of cleaning the surface of the polishing object on the polishing pad 3 while supplying cleaning fluid to the polishing pad 3 from a cleaning fluid supply part 7 after the polishing step using the water.