SEALING FILM FORMING METHOD AND SEALING FILM FORMING APPARATUS

摘要

The present invention provides a method for forming a sealing film on an object such as an organic light emitting device at a low temperature by using a raw material excluding hydrogen or halogen atoms. A sealing film manufacturing apparatus (100) includes: a processing container (1); a stage (3) arranging a target to be processed which is a chain substrate (S); and a plasma source (5) generating nitrogen-containing (N_2) plasma in the processing container (1). The processing container (1) is divided into at least two spaces (S1, S2). The first space (S1) is a plasma generating unit which receives inert and nitrogen gases to generate the nitrogen-containing plasma (P). Also, the second place (2) is a reaction unit which decomposes silicon compounds not containing the hydrogen atoms in the molecules by the nitrogen-containing plasma (P) generated in the first space (S1) and deposits a silicon nitride film used as the sealing film by a chemical vapor deposition (CVD) method.