Formulations of Solutions and Processes for Forming a Substrate Including a Dopant

摘要

Formulations of solutions and processes are described to form a substrate including a dopant. In particular implementations, the dopant can include arsenic (As) or phosphorus (P). In an embodiment, a dopant solution is provided that includes a solvent and a dopant-containing molecule. In a particular embodiment, the solvent of the dopant solution can have a flashpoint that is at least 55° C. In some cases, the dopant-containing molecule can have a molecular weight that is no greater than about 300 g/mol. In other instances, a ratio of a concentration of a dopant-containing molecule relative to a concentration of a contaminant is no greater than about 1×1010.

主权项

1. A solution comprising:
a solvent having a flashpoint of at least about 55° C.; and a dopant-containing molecule including a Group 15 element, wherein a molecular weight of the dopant-containing molecule is no greater than about 300 g/mol, and the Group 15 element includes arsenic or phosphorus.