| 发明名称 |
TRANSPARENT POLYIMIDE SUBSTRATE AND METHOD FOR FABRICATING THE SAME |
| 摘要 |
The present invention provides a transparent polyimide substrate comprising a transparent polyimide film and a cured layer of a polyisocyanate formed on at least one surface of the transparent polyimide film, the polyisocyanate containing an acrylate group and having 2 to 5 isocyanate groups per molecule. The transparent polyimide substrate has excellent scratch resistance, solvent resistance, optical properties and flexibility and low water permeability and is useful as a cover substrate for a flexible electronic device. |
| 申请公布号 |
US2015322223(A1) |
申请公布日期 |
2015.11.12 |
| 申请号 |
US201314649601 |
申请日期 |
2013.12.10 |
| 申请人 |
KOLON INDUSTRIES, INC. |
发明人 |
WOO Hack Yong;JUNG Hak Gee;PARK Hyo Jun |
| 分类号 |
C08J7/04;B29C71/02;B05D3/06 |
主分类号 |
C08J7/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A transparent polyimide substrate comprising a transparent polyimide film and a cured layer of a polyisocyanate formed on at least one surface of the transparent polyimide film, the polyisocyanate containing an acrylate group and having 2 to 5 isocyanate groups per molecule. |
| 地址 |
Gwacheon-si, Gyeonggi-do KR |
