发明名称 BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND
摘要 An underlayer film-forming composition for a self-assembled film having a polymer including 0.2% by mole or more of a unit structure of a polycyclic aromatic vinyl compound relative to all unit structures of the polymer. The polymer includes 20% by mole or more of a unit structure of an aromatic vinyl compound relative to all the unit structures of the polymer and includes 1% by mole or more of a unit structure of the polycyclic aromatic vinyl compound relative to all the unit structures of the aromatic vinyl compound. The aromatic vinyl compound includes an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole. The aromatic vinyl compound includes an optionally substituted styrene and an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole.
申请公布号 US2015322219(A1) 申请公布日期 2015.11.12
申请号 US201314651998 申请日期 2013.12.13
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 SOMEYA Yasunobu;WAKAYAMA Hiroyuki;ENDO Takafumi;SAKAMOTO Rikimaru
分类号 C08J5/18;B05D3/02;B05D1/32;B05D1/00 主分类号 C08J5/18
代理机构 代理人
主权项 1. An underlayer film-forming composition for a self-assembled film, the underlayer film-forming composition comprising a polymer including 0.2% by mole or more of a unit structure of a polycyclic aromatic vinyl compound relative to all unit structures of the polymer.
地址 Chiyoda-ku, Tokyo JP