发明名称 GRAPHENE DEVICES WITH LOCAL DUAL GATES
摘要 An electronic device comprises an insulator, a local first gate embedded in the insulator with a top surface of the first gate being substantially coplanar with a surface of the insulator, a first dielectric layer formed over the first gate and insulator, and a channel. The channel comprises a bilayer graphene layer formed on the first dielectric layer. The first dielectric layer provides a substantially flat surface on which the channel is formed. A second dielectric layer formed over the bilayer graphene layer and a local second gate formed over the second dielectric layer. Each of the local first and second gates is capacitively coupled to the channel of the bilayer graphene layer. The local first and second gates form a first pair of gates to locally control a first portion of the bilayer graphene layer.
申请公布号 US2015325672(A1) 申请公布日期 2015.11.12
申请号 US201514661273 申请日期 2015.03.18
申请人 International Business Machines Corporation 发明人 Chen Zhihong;Franklin Aaron Daniel;Han Shu-Jen
分类号 H01L29/66;H01L29/16;H01L29/423;H01L29/51;H01L21/02;H01L21/04;H01L29/786;H01L29/49 主分类号 H01L29/66
代理机构 代理人
主权项 1. A method of forming an electronic device comprising: forming an insulator; embedding a local first gate in the insulator with a top surface of the first gate being substantially coplanar with a surface of the insulator; depositing a first dielectric layer over the first gate and insulator; forming a channel comprising a bilayer graphene layer formed on the first dielectric layer, wherein the first dielectric layer provides a flat surface on which the channel is formed; depositing a second dielectric layer over the bilayer graphene layer; and forming a local second gate over the second dielectric layer, each of the local first and second gates configured to be capacitively coupled to the channel of the bilayer graphene layer; wherein the local first and second gates form a first pair of gates to locally control a first portion of the bilayer graphene layer.
地址 Armonk NY US