| 发明名称 |
SUPER CONFORMAL METAL PLATING FROM COMPLEXED ELECTROLYTES |
| 摘要 |
A method for at least partially filling a feature on a workpiece generally includes obtaining a workpiece including a feature; and depositing a first layer in the feature, wherein the chemistry for depositing the first layer has a pH in the range of about 6 to about 13, and includes a metal complexing agent and at least one organic or inorganic additive selected from the group consisting of accelerator, suppressor, and leveler. |
| 申请公布号 |
US2015325477(A1) |
申请公布日期 |
2015.11.12 |
| 申请号 |
US201414274611 |
申请日期 |
2014.05.09 |
| 申请人 |
APPLIED Materials, Inc. |
发明人 |
Shaviv Roey;Emesh Ismail T. |
| 分类号 |
H01L21/768;C25D5/02 |
主分类号 |
H01L21/768 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for at least partially filling a feature on a workpiece, the method comprising:
(a) obtaining a workpiece including a feature; and (b) depositing a first layer in the feature, wherein the chemistry for depositing the first layer has a pH in the range of about 6 to about 13, and includes a metal complexing agent and at least one organic or inorganic additive selected from the group consisting of accelerator, suppressor, and leveler. |
| 地址 |
Santa Clara CA US |
